Method of vacuum coating

2022-08-16

There are many methods of vacuum coating, including:

(1) Vacuum evaporation: Clean the substrate to be coated and put it in the coating chamber. After evacuation, heat the film to a high temperature, so that the vapor reaches about 13.3Pa and the vapor molecules fly to the surface of the substrate to condense to form a thin film.

(2) Cathode sputtering: place the substrate to be coated on the opposite side of the cathode, pass an inert gas (such as argon) into the evacuated chamber, keep the pressure at about 1.33-13.3Pa, and then connect the cathode to a 2000V DC power supply, The glow discharge is excited, and the positively charged argon ions strike the cathode, causing it to shoot out atoms, and the sputtered atoms are deposited on the substrate through an inert atmosphere to form a film.

(3) Chemical vapor deposition: The process of obtaining a deposited film by thermally decomposing selected metal compounds or organic compounds.

(4) Ion plating: In essence, ion plating is an organic combination of vacuum evaporation and cathode sputtering, and has both process characteristics. Tables 6-9 list the advantages and disadvantages of various coating methods.

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